Mr. Wonjoo Park Profile

Wonjoo Park

at Samsung Electronics

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Publications (1)

Proceedings Article | 10 May 2016

The study on quantifiable analysis for complex OPCed patterns based on Mask CD SEM contour information

Won Joo Park, Hyung-Joo Lee, Yoon Taek Han, Seuk Hwan Choi, Hak Seung Han, Dong Hoon Chung, Chan-Uk Jeon, Yoshiaki Ogiso, Soichi Shida, Jun Matsumoto, Takayuki Nakamura

Proc. SPIE. 9984, Photomask Japan 2016: XXIII Symposium on Photomask and Next-Generation Lithography Mask Technology

KEYWORDS: Semiconductors, Metrology, Statistical analysis, Image processing, Scanning electron microscopy, Image quality, Photomasks, Optical proximity correction, Critical dimension metrology, Neodymium

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