Woo-Gun Jeong
at Photronics Inc
SPIE Involvement:
Author
Publications (15)

Proceedings Article | 13 July 2017
Proc. SPIE. 10454, Photomask Japan 2017: XXIV Symposium on Photomask and Next-Generation Lithography Mask Technology
KEYWORDS: Etching, Sputter deposition, Chromium, Transmittance, Photomasks, Integrated circuits, Mask making, Critical dimension metrology, Molybdenum, Phase shifts

Proceedings Article | 4 October 2016
Proc. SPIE. 9985, Photomask Technology 2016
KEYWORDS: Optical properties, Etching, Reflectivity, Chromium, Transmittance, Photomasks, Absorbance, Nanoimprint lithography, Electroactive polymers, Phase shifts

Proceedings Article | 26 September 2016
Proc. SPIE. 9985, Photomask Technology 2016
KEYWORDS: Thin films, Lithography, Optical lithography, Modulation, Etching, Manufacturing, Reflectivity, Chromium, Transmittance, Photomasks

Proceedings Article | 19 May 2008
Proc. SPIE. 7028, Photomask and Next-Generation Lithography Mask Technology XV
KEYWORDS: Lithography, Lithographic illumination, Air contamination, Computer simulations, Atomic force microscopy, Scanning electron microscopy, Transmittance, Photomasks, Critical dimension metrology, Semiconducting wafers

Proceedings Article | 1 November 2007
Proc. SPIE. 6730, Photomask Technology 2007
KEYWORDS: Contamination, Air contamination, Glasses, Ions, Inspection, Raman spectroscopy, Pellicles, Photomasks, Fluorine, Adhesives

Showing 5 of 15 publications
SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Advertisement
Advertisement
Back to Top