Woo-Gun Jeong
at Photronics Inc
SPIE Involvement:
Author
Publications (15)

PROCEEDINGS ARTICLE | July 13, 2017
Proc. SPIE. 10454, Photomask Japan 2017: XXIV Symposium on Photomask and Next-Generation Lithography Mask Technology
KEYWORDS: Etching, Sputter deposition, Chromium, Transmittance, Photomasks, Integrated circuits, Mask making, Critical dimension metrology, Molybdenum, Phase shifts

PROCEEDINGS ARTICLE | October 4, 2016
Proc. SPIE. 9985, Photomask Technology 2016
KEYWORDS: Optical properties, Etching, Reflectivity, Chromium, Transmittance, Photomasks, Absorbance, Nanoimprint lithography, Electroactive polymers, Phase shifts

PROCEEDINGS ARTICLE | September 26, 2016
Proc. SPIE. 9985, Photomask Technology 2016
KEYWORDS: Thin films, Lithography, Optical lithography, Modulation, Etching, Manufacturing, Reflectivity, Chromium, Transmittance, Photomasks

PROCEEDINGS ARTICLE | May 19, 2008
Proc. SPIE. 7028, Photomask and Next-Generation Lithography Mask Technology XV
KEYWORDS: Lithography, Lithographic illumination, Air contamination, Computer simulations, Atomic force microscopy, Scanning electron microscopy, Transmittance, Photomasks, Critical dimension metrology, Semiconducting wafers

PROCEEDINGS ARTICLE | November 1, 2007
Proc. SPIE. 6730, Photomask Technology 2007
KEYWORDS: Contamination, Air contamination, Glasses, Ions, Inspection, Raman spectroscopy, Pellicles, Photomasks, Fluorine, Adhesives

PROCEEDINGS ARTICLE | December 17, 2003
Proc. SPIE. 5256, 23rd Annual BACUS Symposium on Photomask Technology
KEYWORDS: Reticles, Deep ultraviolet, Ultraviolet radiation, Particles, Oxygen, Transmittance, Photomasks, Scanning probe microscopy, Mask cleaning, Industrial chemicals

Showing 5 of 15 publications
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