Dr. Woojoo Sim
Principal Scientist at Standigm
SPIE Involvement:
Publications (5)

Proceedings Article | 10 April 2024 Presentation
Proceedings Volume 12954, 1295413 (2024) https://doi.org/10.1117/12.3014637
KEYWORDS: Photomasks, Deep ultraviolet, Optical proximity correction, Extreme ultraviolet lithography, Ecosystems, Lithography, Extreme ultraviolet, Yield improvement, Source mask optimization, Printing

Proceedings Article | 20 March 2019 Presentation + Paper
Woojoo Sim, Kibok Lee, Dingdong Yang, Jaeseung Jeong, Ji-Suk Hong, Sooryong Lee, Honglak Lee
Proceedings Volume 10961, 1096105 (2019) https://doi.org/10.1117/12.2514884
KEYWORDS: Lithography, Photomasks, Neural networks, Data modeling, Process modeling, Image classification, Binary data, Image processing, Computational lithography

Proceedings Article | 23 March 2011 Paper
Proceedings Volume 7973, 79731L (2011) https://doi.org/10.1117/12.879781
KEYWORDS: Photomasks, Optical proximity correction, Semiconducting wafers, Photovoltaics, Data modeling, Lithography, SRAF, Calibration, Nanoimprint lithography, Resolution enhancement technologies

Proceedings Article | 23 March 2011 Paper
Proceedings Volume 7973, 79731C (2011) https://doi.org/10.1117/12.882814
KEYWORDS: Photomasks, Lithography, Optical proximity correction, Manufacturing, SRAF, Image segmentation, Inverse problems, Optimization (mathematics), Electronics, Electroluminescence

Proceedings Article | 29 September 2010 Paper
Proceedings Volume 7823, 782311 (2010) https://doi.org/10.1117/12.864528
KEYWORDS: SRAF, Optical proximity correction, Scanning electron microscopy, Calibration, Diffusion, Photomasks, Lithography, Performance modeling, Cadmium sulfide, Critical dimension metrology

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