Wook Chang
at Hanyang Univ
SPIE Involvement:
Author
Publications (4)

Proceedings Article | 14 May 2007
Proc. SPIE. 6607, Photomask and Next-Generation Lithography Mask Technology XIV
KEYWORDS: Semiconductors, Reticles, Air contamination, Crystals, Electroluminescence, Photomasks, Critical dimension metrology, Semiconducting wafers, Binary data, Phase shifts

Proceedings Article | 22 March 2007
Proc. SPIE. 6519, Advances in Resist Materials and Processing Technology XXIV
KEYWORDS: Mathematical modeling, Semiconductors, Lithography, Electronics, Optical lithography, Capillaries, Applied physics, Semiconducting wafers, Liquids, Chemically amplified resists

Proceedings Article | 21 March 2007
Proc. SPIE. 6517, Emerging Lithographic Technologies XI
KEYWORDS: Semiconductors, Lithography, Optical lithography, Deep ultraviolet, Ultraviolet radiation, Extreme ultraviolet, Extreme ultraviolet lithography, Adhesives, Autoregressive models, Liquids

Proceedings Article | 23 March 2006
Proc. SPIE. 6151, Emerging Lithographic Technologies X
KEYWORDS: Refractive index, Optical lithography, Image processing, Germanium, Chromium, Near field, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Binary data

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