Woon-Hyuk Choi
senior engineer at SAMSUNG Electronics Co Ltd
SPIE Involvement:
Author
Publications (5)

Proceedings Article | 15 March 2012 Paper
Proc. SPIE. 8327, Design for Manufacturability through Design-Process Integration VI
KEYWORDS: Polishing, Logic, Metals, Silicon, Manufacturing, Design for manufacturing, Optical proximity correction, Failure analysis, Yield improvement, Back end of line

Proceedings Article | 4 March 2010 Paper
Proc. SPIE. 7640, Optical Microlithography XXIII
KEYWORDS: Lithography, Optical lithography, Lithographic illumination, Computer simulations, Bridges, Optical proximity correction, Critical dimension metrology, Semiconducting wafers, Tolerancing, Resolution enhancement technologies

Proceedings Article | 7 March 2008 Paper
Proc. SPIE. 6924, Optical Microlithography XXI
KEYWORDS: Wafer-level optics, Data modeling, Calibration, Error analysis, Computer simulations, Photomasks, Critical dimension metrology, Photoresist processing, Semiconducting wafers, Process modeling

Proceedings Article | 30 October 2007 Paper
Proc. SPIE. 6730, Photomask Technology 2007
KEYWORDS: Wafer-level optics, Data modeling, Polarization, Databases, Optical proximity correction, Optimization (mathematics), Semiconducting wafers, Statistical modeling, System on a chip, Instrument modeling

Proceedings Article | 21 March 2007 Paper
Proc. SPIE. 6521, Design for Manufacturability through Design-Process Integration
KEYWORDS: Lithography, Logic, Diffusion, Manufacturing, Electroluminescence, Photomasks, Optical proximity correction, Critical dimension metrology, Resolution enhancement technologies, Design for manufacturability

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