Mr. Woong-Won Seo Profile

Woong-Won Seo

at Photronics Inc

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Author

Publications (2)

Proceedings Article | 28 June 2005 Paper

A study of storage life extension for high performance chemically amplified resist coated blanks

Sin-Ju Yang, Sung-Min Seo, Sang-Hoon Ko, Han-Sun Cha, Geung-Won Kang, Kee-Soo Nam, Woong-Won Seo, Woo-Kyun Jung, Hyun-Kyoon Cho, Jin-Min Kim, Sang-Soo Choi

Proceedings Volume 5853, (2005) https://doi.org/10.1117/12.617054

KEYWORDS: Photomasks, Manufacturing, Critical dimension metrology, Chemically amplified resists, Compact discs, Glasses, Semiconductors, Quantitative analysis, Contamination, Ions

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The importance of advanced e-beam writing system and chemically amplified resist (CAR) coated blank is increasing gradually in high-end grade photomask manufacture according to CD embodiment of 90 nm and beyond technology node requiring because of the shrinkage of design rule in the semiconductor industry. However, many studies have been reported that CAR has several troubles and especially, CAR sensitivity change is occurred by airborne molecular contamination (AMC). So, the storage life of CAR coated blank is shortened. This problem may cause the difficulty of high-end grade photomask manufacture because it is hard to secure stable mean to target (MTT) and CD uniformity by sensitivity change, T-top profile and footing profile. Therefore, the purpose of this paper is to investigate the storage life extension for high performance CAR coated blank through improvement of the packing materials. Firstly, a variety of packing materials were collected and the selected packing materials were analyzed by Automatic Thermal Desorption Gas Chromatograph/Mass Spectrometer (ATD GC/MS) and Ion Chromatograph (IC) to examine AMC generated from the packing materials. As a result, molecular condensables such as alcohols, hydrocarbons and fatty acids were detected and molecular acids and molecular bases those are NH₄+, Cl^-, NO_x^- and SO_x^- were also detected from the packing materials, respectively. From the above results, we selected the best packing materials which generated the least AMC and the worst packing materials which generated the most AMC. Additionally, we verified photomask process with CAR coated blanks which were packed with those packing materials with post coating delay (PCD) by 50 kV e-beam writing system. In consequence, dose to clear (DTC) showed 4.6 μC/cm² at 0 day PCD for both of the best and the worst packing materials of CAR coated blank. After 90 days PCD, DTC variation was only 0.4 μC/cm² for the best packing materials, but DTC variation of 4.0 μC/cm² showed in the worst packing materials. There was 10 times difference in DTC variation between the best and the worst packing materials. As well as, the CD variation at 0.5 μm dense line presented less than 5 nm movement for 90 days PCD.

Proceedings Article | 28 August 2003 Paper

The feasibility study of thin Cr film for low process bias

Woong-Won Seo, Si-Yeul Yoon, Dong-Il Park, Eui-Sang Park, Jin-Min Kim, Sung-Mo Jeong, Sang-Soo Choi, Han-Sun Cha, K. Nam

Proceedings Volume 5130, (2003) https://doi.org/10.1117/12.504181

KEYWORDS: Chromium, Etching, Critical dimension metrology, Photomasks, Dry etching, Backscatter, Thin films, Mask making, Electron beams, Equipment and services

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