Mr. Woong-Won Seo
at Photronics Inc
SPIE Involvement:
Author
Publications (2)

PROCEEDINGS ARTICLE | June 28, 2005
Proc. SPIE. 5853, Photomask and Next-Generation Lithography Mask Technology XII
KEYWORDS: Semiconductors, Contamination, Glasses, Ions, Manufacturing, Quantitative analysis, Photomasks, Compact discs, Critical dimension metrology, Chemically amplified resists

PROCEEDINGS ARTICLE | August 28, 2003
Proc. SPIE. 5130, Photomask and Next-Generation Lithography Mask Technology X
KEYWORDS: Thin films, Electron beams, Backscatter, Etching, Dry etching, Equipment and services, Chromium, Photomasks, Mask making, Critical dimension metrology

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