Xiaojing Su
at Institute of Microelectronics
SPIE Involvement:
Author
Publications (17)

Proceedings Article | 26 September 2019
Proc. SPIE. 11148, Photomask Technology 2019
KEYWORDS: Lithography, Metals, Manufacturing, Optical proximity correction, Standards development

SPIE Journal Paper | 30 May 2019
JM3 Vol. 18 Issue 02
KEYWORDS: Line edge roughness, Failure analysis, Bridges, Etching, Lithography, Probability theory, Overlay metrology, Photomasks, Metals, Optical proximity correction

Proceedings Article | 20 March 2019
Proc. SPIE. 10961, Optical Microlithography XXXII
KEYWORDS: Lithography, Photovoltaics, Printing, Photomasks, Optical proximity correction, SRAF, Critical dimension metrology, Semiconducting wafers, Model-based design, Process modeling

Proceedings Article | 20 March 2019
Proc. SPIE. 10962, Design-Process-Technology Co-optimization for Manufacturability XIII
KEYWORDS: Lithography, Etching, Metals, Electroluminescence, Photomasks, Image classification, Source mask optimization, Molybdenum, Semiconducting wafers, Process modeling

Proceedings Article | 20 March 2019
Proc. SPIE. 10962, Design-Process-Technology Co-optimization for Manufacturability XIII
KEYWORDS: Lithography, Feature extraction, Photomasks, Machine learning, Source mask optimization, Optical proximity correction, Optimization (mathematics)

Showing 5 of 17 publications
SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Advertisement
Advertisement
Back to Top