Xiaojing Su
at Institute of Microelectronics
SPIE Involvement:
Author
Publications (12)

PROCEEDINGS ARTICLE | October 3, 2018
Proc. SPIE. 10810, Photomask Technology 2018
KEYWORDS: Roads, Manufacturing, Microelectronics, Photomasks, Extreme ultraviolet, Image classification, Extreme ultraviolet lithography, SRAF, Model-based design

PROCEEDINGS ARTICLE | March 20, 2018
Proc. SPIE. 10588, Design-Process-Technology Co-optimization for Manufacturability XII
KEYWORDS: Lithography, Image processing, Computer simulations, Image analysis, Image quality, Data processing, Microelectronics, Double patterning technology, Optics manufacturing, New and emerging technologies

SPIE Journal Paper | August 24, 2017
JM3 Vol. 16 Issue 03
KEYWORDS: Photomasks, Lithographic illumination, Immersion lithography, Phase shifts, Etching, Picosecond phenomena, Diffraction, Lithography, Scanners, Manufacturing

PROCEEDINGS ARTICLE | April 4, 2017
Proc. SPIE. 10148, Design-Process-Technology Co-optimization for Manufacturability XI
KEYWORDS: Lithography, Logic, Optical lithography, Metals, Manufacturing, Microelectronics, Photomasks, Double patterning technology, Immersion lithography, Source mask optimization, 193nm lithography

PROCEEDINGS ARTICLE | March 28, 2017
Proc. SPIE. 10148, Design-Process-Technology Co-optimization for Manufacturability XI
KEYWORDS: Lithography, Photovoltaics, Optical lithography, Metals, Image processing, Solar cells, Electroluminescence, Photomasks, Source mask optimization, Molybdenum, Optimization (mathematics), Process modeling, Resolution enhancement technologies, Lead

PROCEEDINGS ARTICLE | March 28, 2017
Proc. SPIE. 10145, Metrology, Inspection, and Process Control for Microlithography XXXI
KEYWORDS: Oxides, Lithography, Diffraction, Optical design, Scanners, Interfaces, Manufacturing, Process control, Optical alignment, Structural design, Semiconducting wafers, Overlay metrology, Diffraction gratings, Absorption

Showing 5 of 12 publications
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