Xaver Thrun
Senior Process Engineer at Qoniac GmbH
SPIE Involvement:
Publications (20)

Proceedings Article | 10 April 2024 Poster + Paper
Alberto Lopez Gomez, Stefan Buhl, Eric Jehnes, Patrick Lomtscher, Manuela Gutsch, Xaver Thrun, Clemens Utzny, Philip Groeger, Johannes Kowalewski
Proceedings Volume 12955, 129553T (2024) https://doi.org/10.1117/12.3022117
KEYWORDS: Semiconducting wafers, Overlay metrology, Scanners, Semiconductors, Modeling, Interpolation, High volume manufacturing, Data modeling, Performance modeling, Mixtures

Proceedings Article | 26 May 2022 Poster + Paper
Ulrich Denker, Philip Gröger, Xaver Thrun, Stefan Buhl, Mycahya Eggleston, Nhi Doan, Gou Kawaguchi, Ranjan Khurana
Proceedings Volume 12053, 120531V (2022) https://doi.org/10.1117/12.2613709
KEYWORDS: Critical dimension metrology, Statistical analysis, Lithography, Error analysis, Data corrections, Visualization, Standards development, Scanners, Fluctuations and noise

Proceedings Article | 22 February 2021 Presentation + Paper
Proceedings Volume 11611, 116111E (2021) https://doi.org/10.1117/12.2583928
KEYWORDS: Process control, Finite element methods, Semiconducting wafers, Optical lithography, Semiconductors, Scanners, Logic, High volume manufacturing, Extreme ultraviolet lithography

SPIE Journal Paper | 12 November 2019
JM3, Vol. 18, Issue 04, 043505, (November 2019) https://doi.org/10.1117/12.10.1117/1.JMM.18.4.043505
KEYWORDS: Semiconducting wafers, Forward error correction, Sensors, Scanners, Optimization (mathematics), Control systems, Contamination, Optical lithography, Chemical mechanical planarization, Databases

Proceedings Article | 26 March 2019 Paper
Proceedings Volume 10959, 109591P (2019) https://doi.org/10.1117/12.2514978
KEYWORDS: Semiconducting wafers, Sensors, Scanners, Optimization (mathematics), Contamination, Data acquisition, Optical lithography

Showing 5 of 20 publications
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