Mr. Xaver Thrun
Senior Process Engineer at Qoniac GmbH
SPIE Involvement:
Author
Publications (15)

PROCEEDINGS ARTICLE | March 13, 2018
Proc. SPIE. 10585, Metrology, Inspection, and Process Control for Microlithography XXXII
KEYWORDS: Oxides, Etching, Metals, Copper, Resistance, Scatterometry, Critical dimension metrology, Semiconducting wafers, Scatter measurement, Chemical mechanical planarization

PROCEEDINGS ARTICLE | March 13, 2018
Proc. SPIE. 10585, Metrology, Inspection, and Process Control for Microlithography XXXII
KEYWORDS: Oxides, Etching, Metals, Copper, Resistance, Capacitance, Photomasks, Critical dimension metrology, Semiconducting wafers, Chemical mechanical planarization

PROCEEDINGS ARTICLE | March 13, 2018
Proc. SPIE. 10585, Metrology, Inspection, and Process Control for Microlithography XXXII
KEYWORDS: Semiconductors, Lithography, Metrology, Etching, Error analysis, Data processing, Machine learning, Optical alignment, Semiconducting wafers, Overlay metrology

PROCEEDINGS ARTICLE | March 21, 2016
Proc. SPIE. 9779, Advances in Patterning Materials and Processes XXXIII
KEYWORDS: Microfluidics, Polymers, Water, Particles, Silicon, Chemistry, Scanning electron microscopy, Photoresist materials, Plasma etching, Photoresist processing, Semiconducting wafers, Fluid dynamics, Mask cleaning, Plasma, Advanced cleaning techniques

PROCEEDINGS ARTICLE | March 8, 2016
Proc. SPIE. 9778, Metrology, Inspection, and Process Control for Microlithography XXX
KEYWORDS: Semiconductors, Electron beam lithography, Electron beams, Sensors, Metals, Image processing, Electrons, Inspection, Scanning electron microscopy, Wafer inspection, Semiconducting wafers, Tin, Defect inspection

PROCEEDINGS ARTICLE | October 23, 2015
Proc. SPIE. 9635, Photomask Technology 2015
KEYWORDS: Photovoltaics, Point spread functions, Electron beams, Scattering, Calibration, Computer simulations, Cadmium sulfide, Critical dimension metrology, Algorithm development, Semiconducting wafers

Showing 5 of 15 publications
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