Dr. Xavier Buch
VIce President, Sales and R&D at JSR Micro NV
SPIE Involvement:
Author
Publications (6)

PROCEEDINGS ARTICLE | March 20, 2015
Proc. SPIE. 9425, Advances in Patterning Materials and Processes XXXII
KEYWORDS: Lithography, Optical lithography, Molecular bridges, Polymers, Metals, Particles, Photoresist materials, Bridges, Line width roughness, Standards development

PROCEEDINGS ARTICLE | April 17, 2014
Proc. SPIE. 9048, Extreme Ultraviolet (EUV) Lithography V
KEYWORDS: Lithography, Chemical species, Diffusion, Extreme ultraviolet, Line width roughness, Absorbance, Extreme ultraviolet lithography, Line edge roughness, Fluorine, Semiconducting wafers

PROCEEDINGS ARTICLE | March 21, 2012
Proc. SPIE. 8323, Alternative Lithographic Technologies IV
KEYWORDS: Lithography, Electron beam lithography, Electron beams, Silicon, Chemistry, Photoresist materials, Extreme ultraviolet, Line width roughness, Semiconducting wafers, Chemically amplified resists

PROCEEDINGS ARTICLE | March 20, 2012
Proc. SPIE. 8325, Advances in Resist Materials and Processing Technology XXIX
KEYWORDS: Optical lithography, Etching, Polymers, Glasses, Photoresist materials, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers, System on a chip

PROCEEDINGS ARTICLE | March 30, 2010
Proc. SPIE. 7639, Advances in Resist Materials and Processing Technology XXVII
KEYWORDS: Particles, Composites, Coating, Chemistry, Manufacturing, Digital watermarking, Immersion lithography, Manufacturing equipment, Photoresist processing, Semiconducting wafers

PROCEEDINGS ARTICLE | March 4, 2010
Proc. SPIE. 7640, Optical Microlithography XXIII
KEYWORDS: Lithography, Metrology, Optical lithography, Etching, Materials processing, Manufacturing, Photomasks, Double patterning technology, Immersion lithography, Algorithm development

Showing 5 of 6 publications
SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Back to Top