Xiang Fang
at Mentor Graphics Taiwan Ltd
SPIE Involvement:
Author
Publications (2)

PROCEEDINGS ARTICLE | June 12, 2018
Proc. SPIE. 10807, Photomask Japan 2018: XXV Symposium on Photomask and Next-Generation Lithography Mask Technology
KEYWORDS: Visualization, Databases, Microelectronics, System identification, Design for manufacturing, Photomasks, Lutetium, Semiconducting wafers, Rule based systems, Design for manufacturability

PROCEEDINGS ARTICLE | July 13, 2017
Proc. SPIE. 10454, Photomask Japan 2017: XXIV Symposium on Photomask and Next-Generation Lithography Mask Technology
KEYWORDS: Reticles, Databases

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