In this paper we combined the hotspot pattern library and the rule-based scoring system into a modularized hotspot-checking rule deck running on an automatic flow. Several DFM (design for manufacture) properties criteria will be defined to build a “score board” for hotspot candidates. When hotspots in the input design are highlighted, the scoring system can identify whether a hotspot is a high risk hotspot or not, and define the severity of the hotspots by extracted DFM properties. The automatic flow will detect which layers are contained in the design then generate a modular rule deck with several corresponding hotspot check modules. The flow also takes snapshots of the high risk hotspots according to the score board automatically. After all the essential hotspot data is collected, the flow will automatically create an HTML-format report which has histograms of properties and overview graph that shows the distribution of hotspots. The aforementioned HTML report containing scored DFM properties and snapshots can help result-viewers to identify the high risk hotspots on the design quickly; namely, users can examine hotspots by snapshots without loading the whole design into layout viewer tools. By comparing the hotspot checking result with real defects from wafer data, a true hotspot’s values of DFM properties can be obtained. We believe this is helpful for users to improve their hotspot rules in accuracy.
The Mask Data Correctness Check (MDCC) is a reticle-level, multi-layer DRC-like check evolved from mask rule
check (MRC). The MDCC uses extended job deck (EJB) to achieve mask composition and to perform a detailed check
for positioning and integrity of each component of the reticle. Different design patterns on the mask will be mapped to
different layers. Therefore, users may be able to review the whole reticle and check the interactions between different
designs before the final mask pattern file is available. However, many types of MDCC check results, such as errors from
overlapping patterns usually have very large and complex-shaped highlighted areas covering the boundary of the design.
Users have to load the result OASIS file and overlap it to the original database that was assembled in MDCC process on
a layout viewer, then search for the details of the check results. We introduce a quick result-reviewing method based on
an html format report generated by Calibre® RVE. In the report generation process, we analyze and extract the essential
part of result OASIS file to a result database (RDB) file by standard verification rule format (SVRF) commands.
Calibre® RVE automatically loads the assembled reticle pattern and generates screen shots of these check results. All the
processes are automatically triggered just after the MDCC process finishes. Users just have to open the html report to
get the information they need: for example, check summary, captured images of results and their coordinates.