Prof. Xiangzhao Wang
Professor at Shanghai Institute of Optics and Fine Mechanics
SPIE Involvement:
Conference Program Committee | Author
Publications (80)

SPIE Journal Paper | 27 February 2019
JM3 Vol. 18 Issue 01
KEYWORDS: Photomasks, Extreme ultraviolet lithography, Lithium, EUV optics, Mechanics

SPIE Journal Paper | 24 January 2019
JM3 Vol. 18 Issue 01
KEYWORDS: Particle filters, Filtering (signal processing), Thermal modeling, Particles, Semiconducting wafers, Projection systems, Lithography, Photomasks, Data modeling, Calibration

SPIE Journal Paper | 3 December 2018
JM3 Vol. 17 Issue 04
KEYWORDS: Photomasks, Optimization (mathematics), Extreme ultraviolet lithography, Computer programming, Computer simulations, Evolutionary algorithms, Lithography, Manufacturing, Lithium, High volume manufacturing

Proceedings Article | 2 November 2018
Proc. SPIE. 10819, Optical Metrology and Inspection for Industrial Applications V
KEYWORDS: Diffraction, Interferometers, Wavefront sensors, Wavefronts, Diffraction gratings, Shearing interferometers

Proceedings Article | 2 November 2018
Proc. SPIE. 10819, Optical Metrology and Inspection for Industrial Applications V
KEYWORDS: Fringe analysis, Error analysis, Gaussian filters, 3D metrology, Projection systems, Phase measurement, Binary data, 3D image processing, Phase shifts

Proceedings Article | 9 August 2018
Proc. SPIE. 10806, Tenth International Conference on Digital Image Processing (ICDIP 2018)
KEYWORDS: Fringe analysis, Image processing, Digital filtering, Adaptive optics, 3D metrology, Image filtering, Image enhancement, Reconstruction algorithms, 3D image processing, Phase shifts

Showing 5 of 80 publications
Conference Committee Involvement (4)
Optical Metrology and Inspection for Industrial Applications VI
20 October 2019 | Hangzhou, China
Optical Metrology and Inspection for Industrial Applications V
11 October 2018 | Beijing, China
Optical Metrology and Inspection for Industrial Applications IV
12 October 2016 | Beijing, China
Optical Metrology and Inspection for Industrial Applications III
9 October 2014 | Beijing, China
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