Dr. Xiao Li
Sr Process Engineer at Broadcom Ltd
SPIE Involvement:
Author
Publications (3)

PROCEEDINGS ARTICLE | March 29, 2006
Proc. SPIE. 6153, Advances in Resist Technology and Processing XXIII
KEYWORDS: Semiconductors, Etching, Metals, Silicon, Coating, Manufacturing, Critical dimension metrology, Thin film coatings, Photoresist processing, Semiconducting wafers

PROCEEDINGS ARTICLE | May 4, 2005
Proc. SPIE. 5753, Advances in Resist Technology and Processing XXII
KEYWORDS: Semiconductors, Lithium, Coating, Manufacturing, Photoresist materials, Critical dimension metrology, Thin film coatings, Photoresist processing, Semiconducting wafers, Process engineering

PROCEEDINGS ARTICLE | May 14, 2004
Proc. SPIE. 5376, Advances in Resist Technology and Processing XXI
KEYWORDS: Semiconductors, Deep ultraviolet, Etching, Silicon, Coating, Manufacturing, Critical dimension metrology, Photoresist processing, Semiconducting wafers, Bottom antireflective coatings

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