Mr. Xiaofei Wu
PhD Candidate at Univ of Hong Kong
SPIE Involvement:
Author
Publications (2)

PROCEEDINGS ARTICLE | March 15, 2016
Proc. SPIE. 9780, Optical Microlithography XXIX
KEYWORDS: Lithography, Electron beam lithography, Error analysis, Photomasks, Source mask optimization, Computational lithography, Critical dimension metrology, Optimization (mathematics), Stochastic processes, Electroluminescent displays

PROCEEDINGS ARTICLE | March 13, 2012
Proc. SPIE. 8326, Optical Microlithography XXV
KEYWORDS: Lithography, Metrology, Genetic algorithms, Optical lithography, Imaging systems, Fourier transforms, Computer simulations, Photomasks, Image storage, Algorithm development

SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Back to Top