Dr. Xiaohai Li
at
SPIE Involvement:
Author
Publications (7)

Proceedings Article | 13 March 2012
Proc. SPIE. 8326, Optical Microlithography XXV
KEYWORDS: Lithography, Optical lithography, Lithographic illumination, Scanners, Image resolution, Photomasks, Extreme ultraviolet lithography, Optical proximity correction, Neodymium, Surface conduction electron emitter displays

Proceedings Article | 23 March 2011
Proc. SPIE. 7973, Optical Microlithography XXIV
KEYWORDS: Lithography, Roads, Lithographic illumination, Detection and tracking algorithms, Image segmentation, Laser induced breakdown spectroscopy, Photomasks, Optical proximity correction, Critical dimension metrology, Tolerancing

Proceedings Article | 25 September 2010
Proc. SPIE. 7823, Photomask Technology 2010
KEYWORDS: Diffraction, Calibration, Image processing, Manufacturing, Photomasks, Immersion lithography, Optical proximity correction, Critical dimension metrology, Semiconducting wafers, Tolerancing

Proceedings Article | 4 March 2010
Proc. SPIE. 7640, Optical Microlithography XXIII
KEYWORDS: Lithography, Optical lithography, Roads, Lithographic illumination, Photomasks, Semiconductor manufacturing, Immersion lithography, Optical proximity correction, Model-based design, Process modeling

Proceedings Article | 11 May 2009
Proc. SPIE. 7379, Photomask and Next-Generation Lithography Mask Technology XVI
KEYWORDS: Lithography, Logic, Optical lithography, Etching, Metals, Silicon, Manufacturing, Photomasks, Double patterning technology, Optical proximity correction

Proceedings Article | 16 March 2009
Proc. SPIE. 7274, Optical Microlithography XXII
KEYWORDS: Optical lithography, Etching, Printing, Photomasks, Double patterning technology, Optical proximity correction, Critical dimension metrology, Semiconducting wafers, Model-based design, Resolution enhancement technologies

Showing 5 of 7 publications
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