Mr. Xiaohui Kang Profile

Xiaohui Kang

at Siemens EDA

SPIE Involvement:

Author

Publications (6)

SPIE Journal Paper | 1 October 2009

Study of the contour-based optical proximity correction methodology

Liang Zhu, Xiaohui Kang, Yili Gu, Steve Yang

JM3, Vol. 8, Issue 04, 043005, (October 2009) https://doi.org/10.1117/12.10.1117/1.3238544

KEYWORDS: Optical proximity correction, Computer simulations, Semiconducting wafers, Image quality, Photomasks, Lithography, Resolution enhancement technologies, Tolerancing, Diffusion, Image processing

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SPIE Journal Paper | 1 April 2009

Depth of focus enhancement for sub-110-nm technology by using KrF double-exposure lithography

Liang Zhu, Yingchun Zhang, Yili Gu, Steve Yang, Xiaohui Kang

JM3, Vol. 8, Issue 02, 023008, (April 2009) https://doi.org/10.1117/12.10.1117/1.3155515

KEYWORDS: Lithography, Critical dimension metrology, Double patterning technology, SRAF, Scanners, Image processing, Photomasks, Optical proximity correction, Resolution enhancement technologies, Semiconducting wafers

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Proceedings Article | 16 March 2009 Paper

Model-based retarget for 45nm node and beyond

Ellyn Yang, Cheng He Li, Xiao Hui Kang, Eric Guo

Proceedings Volume 7274, 727428 (2009) https://doi.org/10.1117/12.814085

KEYWORDS: Optical proximity correction, Model-based design, Process modeling, Design for manufacturing, Manufacturing, Optical lithography, Design for manufacturability, Calibration, Semiconductors, Lithography

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Proceedings Article | 13 March 2009 Paper

Contour-based optical proximity correction

Brian Zhou, Liang Zhu, Yingchun Zhang, Yili Gu, Xiaohui Kang

Proceedings Volume 7275, 72751H (2009) https://doi.org/10.1117/12.814832

KEYWORDS: Optical proximity correction, Semiconducting wafers, Image processing, Critical dimension metrology, Metals, Structural design, Resolution enhancement technologies, Error control coding, Semiconductor manufacturing, Visualization

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Proceedings Article | 13 March 2009 Paper

Model-based adaptive fragmentation

Daisy Liu, Cheng He Li, Xiao Hui Kang

Proceedings Volume 7275, 72751I (2009) https://doi.org/10.1117/12.814833

KEYWORDS: Model-based design, Optical proximity correction, Critical dimension metrology, Optics manufacturing, Visualization, Optical properties, Integrated optics, Image compression, Distortion, Design for manufacturability

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Proceedings Article | 7 March 2008 Paper

OPC optimization for double dipole lithography and its application on 45nm node with dry exposure

Se-Jin Park, Jae-Kyung Seo, ChengHe Li, Daisy Liu, Petros An, Xiao-Hui Kang, Eric Guo

Proceedings Volume 6924, 69243O (2008) https://doi.org/10.1117/12.773290

KEYWORDS: SRAF, Photomasks, Optical proximity correction, Lithography, Semiconducting wafers, Phase shifts, Lithographic illumination, Metals, Scanners, Logic

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Showing 5 of 6 publications

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