Xiaohui Kang
at Mentor Graphics Corp.
SPIE Involvement:
Author
Publications (6)

SPIE Journal Paper | 1 October 2009
JM3 Vol. 8 Issue 04
KEYWORDS: Optical proximity correction, Computer simulations, Semiconducting wafers, Image quality, Photomasks, Lithography, Resolution enhancement technologies, Tolerancing, Diffusion, Image processing

SPIE Journal Paper | 1 April 2009
JM3 Vol. 8 Issue 02
KEYWORDS: Lithography, Critical dimension metrology, Double patterning technology, SRAF, Scanners, Image processing, Photomasks, Optical proximity correction, Resolution enhancement technologies, Semiconducting wafers

Proceedings Article | 16 March 2009
Proc. SPIE. 7274, Optical Microlithography XXII
KEYWORDS: Semiconductors, Lithography, Optical lithography, Calibration, Manufacturing, Design for manufacturing, Optical proximity correction, Model-based design, Process modeling, Design for manufacturability

Proceedings Article | 13 March 2009
Proc. SPIE. 7275, Design for Manufacturability through Design-Process Integration III
KEYWORDS: Image compression, Optical properties, Visualization, Distortion, Integrated optics, Optical proximity correction, Critical dimension metrology, Optics manufacturing, Model-based design, Design for manufacturability

Proceedings Article | 13 March 2009
Proc. SPIE. 7275, Design for Manufacturability through Design-Process Integration III
KEYWORDS: Visualization, Metals, Image processing, Semiconductor manufacturing, Optical proximity correction, Critical dimension metrology, Structural design, Error control coding, Semiconducting wafers, Resolution enhancement technologies

Showing 5 of 6 publications
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