Dr. Xiaolu Huang
at Huaian Image Device Manufacturer Corp
SPIE Involvement:
Author
Publications (1)

Proceedings Article | 26 September 2019
Proc. SPIE. 11148, Photomask Technology 2019
KEYWORDS: Lithography, CMOS sensors, Optical properties, Photoresist materials, Optical proximity correction, Sensor technology, Model-based design

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