Mr. Xiaoqing Xu Profile

Xiaoqing Xu

Senior Research Engineer at ARM Inc

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Author

Publications (6)

Proceedings Article | 16 October 2017 Presentation + Paper

Machine learning for mask/wafer hotspot detection and mask synthesis

Yibo Lin, Xiaoqing Xu, Jiaojiao Ou, David Pan

Proceedings Volume 10451, 104510A (2017) https://doi.org/10.1117/12.2282943

KEYWORDS: Machine learning, Optical proximity correction, SRAF, Feature extraction, Model-based design, Photomasks, Lithography, Data modeling, Neural networks, Printing

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SPIE Journal Paper | 14 June 2017

Triple/quadruple patterning layout decomposition via linear programming and iterative rounding

Yibo Lin, Xiaoqing Xu, Bei Yu, Ross Baldick, David Pan

JM3, Vol. 16, Issue 02, 023507, (June 2017) https://doi.org/10.1117/12.10.1117/1.JMM.16.2.023507

KEYWORDS: Electron beam lithography, Extreme ultraviolet lithography, Computer programming, Lithography, Metals, Semiconductors, Directed self assembly, Manufacturing, Photomasks

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Proceedings Article | 16 March 2016 Paper

Triple/quadruple patterning layout decomposition via novel linear programming and iterative rounding

Yibo Lin, Xiaoqing Xu, Bei Yu, Ross Baldick, David Pan

Proceedings Volume 9781, 97810M (2016) https://doi.org/10.1117/12.2218628

KEYWORDS: Lithography, Manufacturing, Metals, Semiconductors, New and emerging technologies, Directed self assembly, Silicon carbide

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Proceedings Article | 15 March 2016 Paper

Standard cell pin access and physical design in advanced lithography

Xiaoqing Xu, Brian Cline, Greg Yeric, David Pan

Proceedings Volume 9780, 97800P (2016) https://doi.org/10.1117/12.2222289

KEYWORDS: Lithography, Optical lithography, Design for manufacturability, Computational lithography, Optical tracking, Standards development, Metals, Design for manufacturing, Photomasks, 193nm lithography, Legal, Double patterning technology

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SPIE Journal Paper | 3 February 2016

Systematic framework for evaluating standard cell middle-of-line robustness for multiple patterning lithography

Brian Cline, Greg Yeric, Bei Yu, David Pan, Xiaoqing Xu

JM3, Vol. 15, Issue 02, 021202, (February 2016) https://doi.org/10.1117/12.10.1117/1.JMM.15.2.021202

KEYWORDS: Lithography, Optical lithography, Photomasks, Standards development, Legal, Manufacturing, Logic, Electrochemical etching, Double patterning technology, Algorithms

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Proceedings Article | 18 March 2015 Paper

A systematic framework for evaluating standard cell middle-of-line (MOL) robustness for multiple patterning

Xiaoqing Xu, Brian Cline, Greg Yeric, Bei Yu, David Pan

Proceedings Volume 9427, 942707 (2015) https://doi.org/10.1117/12.2085918

KEYWORDS: Optical lithography, Standards development, 193nm lithography, Photomasks, Lithography, Double patterning technology, Legal, Logic, Design for manufacturability, Manufacturing

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Showing 5 of 6 publications

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