Dr. Xiaoxiao (Michelle) Zhang
at GLOBALFOUNDRIES Inc
SPIE Involvement:
Author
Publications (6)

Proceedings Article | 24 March 2016
Proc. SPIE. 9778, Metrology, Inspection, and Process Control for Microlithography XXX
KEYWORDS: Lithography, Metrology, Data modeling, Etching, Scanners, Control systems, Scatterometry, Optical metrology, Time metrology, Signal processing, Measurement devices, Transistors, Critical dimension metrology, Semiconducting wafers, Model-based design, Instrument modeling

Proceedings Article | 18 March 2016
Proc. SPIE. 9778, Metrology, Inspection, and Process Control for Microlithography XXX
KEYWORDS: Metrology, Diffractive optical elements, Metals, Atomic force microscopy, Transmission electron microscopy, Scatterometry, 3D metrology, Semiconducting wafers, Pulmonary function tests, Overlay metrology

Proceedings Article | 15 March 2016
Proc. SPIE. 9780, Optical Microlithography XXIX
KEYWORDS: Lithography, Optical lithography, Dielectrophoresis, Line width roughness, Semiconductor manufacturing, Line edge roughness, Chemical mechanical planarization

Proceedings Article | 19 March 2015
Proc. SPIE. 9424, Metrology, Inspection, and Process Control for Microlithography XXIX
KEYWORDS: Metrology, Image segmentation, Atomic force microscopy, Optical testing, Scanning electron microscopy, 3D metrology, Critical dimension metrology, Semiconducting wafers, Overlay metrology, Back end of line

SPIE Journal Paper | 1 October 2014
JM3 Vol. 13 Issue 04
KEYWORDS: Metrology, Transmission electron microscopy, Semiconducting wafers, Scanning electron microscopy, Electron microscopes, Process control, 3D metrology, Diffractive optical elements, Oxides

Proceedings Article | 2 April 2014
Proc. SPIE. 9050, Metrology, Inspection, and Process Control for Microlithography XXVIII
KEYWORDS: Oxides, Metrology, Diffractive optical elements, Calibration, Scanning electron microscopy, Transmission electron microscopy, 3D metrology, Process control, Semiconducting wafers

Showing 5 of 6 publications
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