Xiaoxu Ma
at Kyoto Univ
SPIE Involvement:
Author
Publications (1)

PROCEEDINGS ARTICLE | March 18, 2015
Proc. SPIE. 9426, Optical Microlithography XXVIII
KEYWORDS: Photoresist materials, 3D microstructuring, Grayscale lithography, Photoresist developing, Optical lithography, Lithography, Digital micromirror devices, 3D acquisition, Error analysis, Standards development

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