Xiaoyang Li
SPIE Involvement:
Publications (5)

Proceedings Article | 28 April 2023 Presentation + Paper
Austin Peng, Christopher Kaplan, Jeff Lu, Michael Crouse, Zuanyi Li, Xiaobo Xie, David Rio, Achim Woessner, Alexander Tan, Cuiping Zhang, Xiaoyang Li, Dezheng Sun, Stephen Hsu, Rafael Howell, Joerg Zimmermann
Proceedings Volume 12494, 124940C (2023) https://doi.org/10.1117/12.2657454
KEYWORDS: Source mask optimization, Computational lithography, Nanoimprint lithography, Extreme ultraviolet, Semiconducting wafers, Scanners, Modeling, Reticles, Artificial intelligence, Light sources and illumination

Proceedings Article | 28 April 2023 Presentation + Paper
Proceedings Volume 12494, 124940B (2023) https://doi.org/10.1117/12.2658508
KEYWORDS: Stochastic processes, Data modeling, Optical proximity correction, Line width roughness, Source mask optimization, Computational lithography, Semiconducting wafers, Modeling, Performance modeling, Photons

Proceedings Article | 16 September 2022 Paper
Proceedings Volume 12325, 1232502 (2022) https://doi.org/10.1117/12.2651194
KEYWORDS: Photomasks, Critical dimension metrology, Tolerancing, Extreme ultraviolet, Extreme ultraviolet lithography, Source mask optimization, Stochastic processes, Semiconducting wafers, Lithographic illumination

Proceedings Article | 26 May 2022 Presentation + Paper
Proceedings Volume 12051, 1205109 (2022) https://doi.org/10.1117/12.2616830
KEYWORDS: Semiconducting wafers, Chromatic aberrations, Data modeling, Calibration, Source mask optimization, Photomasks, SRAF, Copper indium disulfide, Optical lithography, Image processing

Proceedings Article | 26 February 2021 Presentation
Will Conley, Vince Vince Plachecki, Stephen Hsu, Michael Crouse, Rongkuo Zhao, John He, Pieter Scheijgrond, Dezheng Sun, Xiaoyang Li, Dongqing Zhang, Ming-Chun Tien, Jun Ye, Rafael Howell, Chen Liu, Xiaolong Zhang, Hai Li, Zuanyi Li, Xiaobo Xie, Jing Su, Yzzer Roman
Proceedings Volume 11613, 116130E (2021) https://doi.org/10.1117/12.2585651

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