Ms. Xie Shao Profile

Xie Shao

Research & Development Group Manager at Brewer Science Inc

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Author

Publications (7)

Proceedings Article | 24 August 2001 Paper

Development of full-fill bottom antireflective coatings for dual-damascene process

Yubao Wang, Xiaoming Wu, Gu Xu, James Lamb, John Sullivan, James Claypool, Jackie Backus, Sean Trautman, Xie Shao, Satoshi Takei, Yasuhisa Sone, Kenichi Mizusawa, Hiroyoshi Fukuro

Proceedings Volume 4345, (2001) https://doi.org/10.1117/12.436917

KEYWORDS: Coating, Etching, Photoresist materials, Semiconducting wafers, Bottom antireflective coatings, Antireflective coatings, Lithography, Thin films, Critical dimension metrology, Deep ultraviolet

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Proceedings Article | 24 August 2001 Paper

Improved crosslinkable polymeric binders for 193-nm bottom antireflective coatings (BARCs)

James Meador, Xie Shao, Mandar Bhave, Chris Cox, John Thompson, Debra Thomas, Stephen Gibbons, Ashley Farnsworth, Michael Rich

Proceedings Volume 4345, (2001) https://doi.org/10.1117/12.436918

KEYWORDS: Polymers, Photoresist materials, Reflectivity, Etching, Plasma etching, Lithography, Silicon, Scanning electron microscopy, Semiconducting wafers, Ions

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Proceedings Article | 23 June 2000 Paper

Second-generation 193-nm bottom antireflective coatings (BARCs)

James Meador, Xie Shao, Vandana Krishnamurthy, Mikko Arjona, Mandar Bhave, Gu Xu, James Claypool, Anne Lindgren

Proceedings Volume 3999, (2000) https://doi.org/10.1117/12.388264

KEYWORDS: Reflectivity, Etching, Polymers, Plasma etching, Manufacturing, Photoresist materials, Lithography, Semiconducting wafers, Particles, Absorbance

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Proceedings Article | 2 June 2000 Paper

Advancements in organic antireflective coatings for dual-damascene processes

Shreeram Deshpande, Xie Shao, James Lamb, Nickolas Brakensiek, Joe Johnson, Xiaoming Wu, Gu Xu, William Simmons

Proceedings Volume 3998, (2000) https://doi.org/10.1117/12.386539

KEYWORDS: Etching, Optical lithography, Metals, Photoresist processing, Copper, Dielectrics, Critical dimension metrology, Photomasks, Semiconductor manufacturing, Semiconductors

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Proceedings Article | 14 June 1999 Paper

Broadband planarizing antireflective coating for i-line, DUV, and 193-nm microlithographic applications

Xie Shao, James Lamb, James Claypool, William Simmons, Earnest Murphy

Proceedings Volume 3677, (1999) https://doi.org/10.1117/12.350877

KEYWORDS: Reflectivity, Etching, Critical dimension metrology, Photoresist materials, Polymers, Prototyping, Coating, Deep ultraviolet, Lithography, Oxides

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Proceedings Article | 11 June 1999 Paper

Recent progress in 193-nm antireflective coatings

James Meador, Douglas Guerrero, Gu Xu, Xie Shao, Norman Dobson, James Claypool, Kelly Nowak

Proceedings Volume 3678, (1999) https://doi.org/10.1117/12.350269

KEYWORDS: Photoresist materials, Etching, Plasma etching, Polymers, Absorbance, Reflectivity, Plasma, Chemistry, Data modeling, Silicon

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Proceedings Article | 8 June 1998 Paper

Fast-etch antireflective coating for sub-0.35-um i-line microlithography applications

Paul Williams, Xie Shao, James Lamb, Colin Hester, Tony Flaim

Proceedings Volume 3332, (1998) https://doi.org/10.1117/12.308762

KEYWORDS: Etching, Photoresist materials, Lithography, Coating, Standards development, Reflectivity, Bottom antireflective coatings, Absorbance, Manufacturing, Radon

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Showing 5 of 7 publications

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