Dr. Xima Zhang
Manager at Mentor Graphics Corp
SPIE Involvement:
Author
Publications (3)

PROCEEDINGS ARTICLE | March 15, 2016
Proc. SPIE. 9780, Optical Microlithography XXIX
KEYWORDS: Lithography, Optical lithography, Data modeling, Visualization, Metals, Computer programming, Photomasks, Computational lithography, Optical proximity correction, Semiconducting wafers, Model-based design, Resolution enhancement technologies

PROCEEDINGS ARTICLE | April 1, 2008
Proc. SPIE. 6924, Optical Microlithography XXI
KEYWORDS: Aberration correction, Manufacturing, Scanning electron microscopy, Printing, Bridges, Optical proximity correction, Algorithm development, Semiconducting wafers, Illumination engineering, Resolution enhancement technologies

PROCEEDINGS ARTICLE | July 12, 2002
Proc. SPIE. 4692, Design, Process Integration, and Characterization for Microelectronics
KEYWORDS: Semiconductors, Lithography, Manufacturing, Control systems, Microelectronics, Field effect transistors, Computer aided design, Nanoelectronics, Yield improvement, Design for manufacturability

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