Dr. Xin Wu
Engineer at Xilinx INC
SPIE Involvement:
Author
Publications (8)

Proceedings Article | 27 June 2019
Proc. SPIE. 11178, Photomask Japan 2019: XXVI Symposium on Photomask and Next-Generation Lithography Mask Technology
KEYWORDS: Semiconductors, Logic, Field programmable gate arrays, Photomasks, Machine learning, Artificial intelligence, Analog electronics, System on a chip

Proceedings Article | 16 September 2014
Proc. SPIE. 9235, Photomask Technology 2014
KEYWORDS: Optical lithography, Silicon, Diffusion, Field programmable gate arrays, Photomasks, Double patterning technology, Optical proximity correction, Optical alignment, Critical dimension metrology, Semiconducting wafers

Proceedings Article | 23 September 2009
Proc. SPIE. 7488, Photomask Technology 2009
KEYWORDS: Air contamination, Manufacturing, Field programmable gate arrays, Photomasks, Mask making, Critical dimension metrology, Semiconducting wafers, Failure analysis, Resolution enhancement technologies

Proceedings Article | 4 March 2008
Proc. SPIE. 6925, Design for Manufacturability through Design-Process Integration II
KEYWORDS: Lithography, Oscillators, Etching, Diffusion, Scanning electron microscopy, Transistors, Optical proximity correction, Semiconducting wafers, Model-based design, Standards development

Proceedings Article | 21 March 2006
Proc. SPIE. 6154, Optical Microlithography XIX
KEYWORDS: Semiconductors, Lithography, Calibration, Image processing, Manufacturing, Scanning electron microscopy, Image quality, Photomasks, Optical proximity correction, Semiconducting wafers

Showing 5 of 8 publications
SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Advertisement
Advertisement
Back to Top