Xin Zheng
at
SPIE Involvement:
Author
Publications (4)

PROCEEDINGS ARTICLE | June 30, 2012
Proc. SPIE. 8441, Photomask and Next-Generation Lithography Mask Technology XIX
KEYWORDS: Data modeling, Calibration, Image processing, 3D modeling, Scanning electron microscopy, Printing, Optical proximity correction, SRAF, Semiconducting wafers, Process modeling

PROCEEDINGS ARTICLE | March 13, 2012
Proc. SPIE. 8326, Optical Microlithography XXV
KEYWORDS: Mathematical modeling, Lithography, Optical lithography, Data modeling, Calibration, 3D modeling, Scanning electron microscopy, Photoresist materials, Photomasks, Optical proximity correction

PROCEEDINGS ARTICLE | March 16, 2009
Proc. SPIE. 7274, Optical Microlithography XXII
KEYWORDS: Optical lithography, Data modeling, Calibration, Diffusion, Image analysis, Optical resolution, Image enhancement, Optical proximity correction, Semiconducting wafers, Chemically amplified resists

PROCEEDINGS ARTICLE | November 15, 2007
Proc. SPIE. 6787, MIPPR 2007: Multispectral Image Processing
KEYWORDS: Point spread functions, Extremely high frequency, Super resolution, Imaging systems, Image restoration, Image resolution, Inverse problems, Antennas, Passive millimeter wave imaging, Passive millimeter wave sensors

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