Dr. Xindong Gao
at KLA China
SPIE Involvement:
Author
Publications (3)

Proceedings Article | 26 March 2019
Proc. SPIE. 10959, Metrology, Inspection, and Process Control for Microlithography XXXIII
KEYWORDS: Optical filters, Metrology, Polarization, Inspection, Scatterometry, Process control, Modeling and simulation, Semiconducting wafers, Overlay metrology

Proceedings Article | 26 March 2019
Proc. SPIE. 10959, Metrology, Inspection, and Process Control for Microlithography XXXIII
KEYWORDS: Scatterometry, Process control, Overlay metrology

Proceedings Article | 24 March 2016
Proc. SPIE. 9778, Metrology, Inspection, and Process Control for Microlithography XXX
KEYWORDS: Semiconductors, Diffraction, Metrology, Image processing, Manufacturing, Physics, Scatterometry, Optical metrology, Signal processing, Process control, Semiconductor manufacturing, Optical alignment, Neodymium, Semiconducting wafers, Optics manufacturing, Overlay metrology, Accuracy assessment

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