Dr. Austin Xingyue Peng
SPIE Involvement:
Publications (6)

Proceedings Article | 28 April 2023 Presentation + Paper
Proceedings Volume 12494, 124940B (2023) https://doi.org/10.1117/12.2658508
KEYWORDS: Stochastic processes, Data modeling, Optical proximity correction, Line width roughness, Source mask optimization, Computational lithography, Semiconducting wafers, Modeling, Performance modeling, Photons

Proceedings Article | 28 April 2023 Presentation + Paper
Austin Peng, Christopher Kaplan, Jeff Lu, Michael Crouse, Zuanyi Li, Xiaobo Xie, David Rio, Achim Woessner, Alexander Tan, Cuiping Zhang, Xiaoyang Li, Dezheng Sun, Stephen Hsu, Rafael Howell, Joerg Zimmermann
Proceedings Volume 12494, 124940C (2023) https://doi.org/10.1117/12.2657454
KEYWORDS: Source mask optimization, Computational lithography, Nanoimprint lithography, Extreme ultraviolet, Semiconducting wafers, Scanners, Modeling, Reticles, Artificial intelligence, Light sources and illumination

Proceedings Article | 18 March 2019 Presentation
Proceedings Volume 10961, 109610J (2019) https://doi.org/10.1117/12.2515725
KEYWORDS: Critical dimension metrology, Light sources, Semiconducting wafers, Yield improvement, Deep ultraviolet, Scanners, Control systems, Source mask optimization

Proceedings Article | 20 March 2018 Presentation + Paper
Proceedings Volume 10587, 105870G (2018) https://doi.org/10.1117/12.2297397
KEYWORDS: Photomasks, Source mask optimization, Optical proximity correction, Lithography, SRAF, Semiconducting wafers, Printing, Electroluminescence, Scanning electron microscopy, Pattern recognition

Proceedings Article | 24 March 2017 Presentation + Paper
Du Hyun Beak, Ju Hee Shin, Tony Park, Dong Kyeng Han, Jin Phil Choi, Jeong Heung Kong, Young Seog Kang, Se Yeon Jang, Peter Nikolsky, Chris Strolenberg, Noh-Kyoung Park, Khalid Elbattay, Vito Tomasello, Austin Peng, Anand Guntuka, Zhao-Ze Li, Ronald Goossens, Machi Ryu, Jangho Shin, Chung-Yong Kim, Andrew Moe, Yun-A Sung
Proceedings Volume 10147, 101470A (2017) https://doi.org/10.1117/12.2258339
KEYWORDS: Critical dimension metrology, Scanners, Lithographic illumination, Image processing, Process control, Computational lithography, Semiconducting wafers, Data modeling, Metrology, Photomasks, Calibration, Finite element methods, Laser scanners, 3D scanning

Showing 5 of 6 publications
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