Mr. Xintuo Dai
at GLOBALFOUNDRIES Inc
SPIE Involvement:
Author
Publications (3)

PROCEEDINGS ARTICLE | March 28, 2017
Proc. SPIE. 10145, Metrology, Inspection, and Process Control for Microlithography XXXI
KEYWORDS: Wafer-level optics, Lithography, Metrology, Inspection, Optical metrology, Process control, Finite element methods, Critical dimension metrology, Line edge roughness, Semiconducting wafers, Optics manufacturing, Defect inspection

PROCEEDINGS ARTICLE | March 28, 2017
Proc. SPIE. 10145, Metrology, Inspection, and Process Control for Microlithography XXXI
KEYWORDS: Electron beam lithography, Metrology, Optical lithography, Image processing, Manufacturing, Inspection, Image resolution, Scanning electron microscopy, Process control, Dimensional metrology, Critical dimension metrology, Semiconducting wafers, Overlay metrology, Defect inspection

PROCEEDINGS ARTICLE | March 28, 2017
Proc. SPIE. 10145, Metrology, Inspection, and Process Control for Microlithography XXXI
KEYWORDS: Semiconductors, Signal to noise ratio, Metrology, Logic, X-rays, Silicon, Inspection, Image resolution, Scanning electron microscopy, Signal processing, 3D metrology, High volume manufacturing, Critical dimension metrology, Overlay metrology, Fin field effect transitor, Nanowires

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