Dr. Xinyu Gu
Graduate Research Assistant at Dow Chemical Co
SPIE Involvement:
Author
Publications (5)

PROCEEDINGS ARTICLE | April 16, 2011
Proc. SPIE. 7972, Advances in Resist Materials and Processing Technology XXVIII
KEYWORDS: Lithography, Optical lithography, Polymers, Diffusion, Chemistry, Scanning electron microscopy, Photomasks, Absorbance, Chemical analysis, Line edge roughness

PROCEEDINGS ARTICLE | April 16, 2011
Proc. SPIE. 7972, Advances in Resist Materials and Processing Technology XXVIII
KEYWORDS: Lithography, Polymers, Ultraviolet radiation, Molecules, NOx, Polymerization, Photomasks, Line edge roughness, Chlorine, Analog electronics

PROCEEDINGS ARTICLE | March 26, 2010
Proc. SPIE. 7639, Advances in Resist Materials and Processing Technology XXVII
KEYWORDS: Semiconductors, Lithography, Polymers, Image processing, Manufacturing, Interferometry, Photoresist materials, Photomasks, Double patterning technology, Critical dimension metrology

PROCEEDINGS ARTICLE | April 1, 2009
Proc. SPIE. 7273, Advances in Resist Materials and Processing Technology XXVI
KEYWORDS: Lithography, Optical lithography, Sensors, Polymers, Crystals, Diffusion, Photomasks, Extreme ultraviolet lithography, Polymer thin films, Temperature metrology

PROCEEDINGS ARTICLE | April 1, 2009
Proc. SPIE. 7273, Advances in Resist Materials and Processing Technology XXVI
KEYWORDS: Lithography, Polymers, Molecules, Crystals, Diffusion, Nitrogen, Liquid crystals, Absorbance, Liquids, Absorption

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