Dr. Xisen Hou
Senior Chemist at DuPont Electronics & Imaging
SPIE Involvement:
Author
Publications (5)

SPIE Journal Paper | 6 June 2019
JM3 Vol. 18 Issue 02
KEYWORDS: Ions, Polymers, Silicon, Photoresist materials, Mass spectrometry, Molecules, Photoresist developing, Neodymium, Gold, Chemical analysis

Proceedings Article | 26 March 2019
Proc. SPIE. 10959, Metrology, Inspection, and Process Control for Microlithography XXXIII
KEYWORDS: Ions, Silicon, Polymers, Chemical analysis, Mass spectrometry, Chemically amplified resists, Molecules, Gold, Semiconducting wafers

Proceedings Article | 25 March 2019
Proc. SPIE. 10960, Advances in Patterning Materials and Processes XXXVI
KEYWORDS: Polymers, Ions, Photoresist materials, Molecules, Polymer thin films, Mass spectrometry, Molecular aggregates, Statistical analysis, Gold, Photoresist developing

Proceedings Article | 23 March 2018
Proc. SPIE. 10587, Optical Microlithography XXXI
KEYWORDS: Line width roughness, Scanning electron microscopy

Proceedings Article | 13 March 2018
Proc. SPIE. 10586, Advances in Patterning Materials and Processes XXXV
KEYWORDS: Photoresist materials, Line width roughness, Critical dimension metrology, Lithography, Photoresist developing, Optical lithography, Extreme ultraviolet lithography, Coating, Defect inspection, Photoresist processing, Photoresist technology

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