Ms. Xiuhong Wei
at Technische Univ Delft
SPIE Involvement:
Author
Publications (2)

PROCEEDINGS ARTICLE | May 12, 2004
Proc. SPIE. 5754, Optical Microlithography XVIII
KEYWORDS: Mathematical modeling, Polarization, Magnetism, Chromium, 3D modeling, Finite element methods, Photomasks, Binary data, Dielectric polarization, Maxwell's equations

PROCEEDINGS ARTICLE | May 12, 2004
Proc. SPIE. 5754, Optical Microlithography XVIII
KEYWORDS: Diffraction, Reticles, Polarization, Chromium, Near field, Photomasks, Optical proximity correction, Critical dimension metrology, Semiconducting wafers, Binary data

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