Xuedong Fan
at Shanghai Huali Microelectronics Corp
SPIE Involvement:
Author
Publications (1)

Proceedings Article | 23 March 2020 Paper
Proc. SPIE. 11328, Design-Process-Technology Co-optimization for Manufacturability XIV
KEYWORDS: Semiconductors, Lithography, Monochromatic aberrations, Optical lithography, Image processing, Image resolution, Scanning electron microscopy, Computational lithography, Critical dimension metrology, Semiconducting wafers

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