Dr. Xuelian Zhu
Sr. Engineer TD Research at GLOBALFOUNDRIES Inc
SPIE Involvement:
Publications (5)

Proceedings Article | 28 March 2017 Presentation + Paper
L. Liebmann, V. Gerousis, Paul Gutwin, Xuelian Zhu, Jan Petykiewicz
Proceedings Volume 10148, 101480F (2017) https://doi.org/10.1117/12.2259981
KEYWORDS: Resistance, Lithography, Logic, Capacitance, Yield improvement, Optical lithography, Semiconductors, Extreme ultraviolet lithography, Optical design, Design for manufacturability, Manufacturing

Proceedings Article | 17 April 2012 Paper
U. Okoroanyanwu, J. Heumann, X. Zhu, C. Clifford, F. Jiang, P. Mangat, R. Ghaskadavi, E. Mohn, R. Moses, O. Wood, H. Rolff, T. Schedel, R. Cantrell, P. Nesladek, N. LiCausi, X. Cai, W. Taylor, J. Schefske, M. Bender, N. Schmidt
Proceedings Volume 8352, 83520V (2012) https://doi.org/10.1117/12.923134
KEYWORDS: Photomasks, Inspection, Semiconducting wafers, Optical inspection, Extreme ultraviolet, Reflectivity, Defect detection, Mirrors, Scanning electron microscopy, Defect inspection

Proceedings Article | 14 March 2012 Paper
Obert Wood, John Arnold, Timothy Brunner, Martin Burkhardt, James H.-C. Chen, Deniz Civay, Susan S.-C. Fan, Emily Gallagher, Scott Halle, Ming He, Craig Higgins, Hirokazu Kato, Jongwook Kye, Chiew-Seng Koay, Guillaume Landie, Pak Leung, Gregory McIntyre, Satoshi Nagai, Karen Petrillo, Sudhar Raghunathan, Ralph Schlief, Lei Sun, Alfred Wagner, Tom Wallow, Yunpeng Yin, Xuelian Zhu, Matthew Colburn, Daniel Corliss, Cecilia Smolinski
Proceedings Volume 8322, 832203 (2012) https://doi.org/10.1117/12.916292
KEYWORDS: Extreme ultraviolet lithography, Extreme ultraviolet, Photomasks, Manufacturing, Lithography, Immersion lithography, Optical lithography, Metals, Semiconducting wafers, Overlay metrology

Proceedings Article | 16 February 2009 Paper
Xuelian Zhu, Ying Zhang, Dinesh Chandra, Shih-Chieh Cheng, James Kikkawa, Shu Yang
Proceedings Volume 7223, 72231C (2009) https://doi.org/10.1117/12.809275
KEYWORDS: Silicon, Diamond, Photonic crystals, Nanoparticles, Nanolithography, Diamond patterning, Scanning electron microscopy, Modulation, Physics, Tolerancing

Proceedings Article | 14 February 2009 Paper
Proceedings Volume 7223, 72230A (2009) https://doi.org/10.1117/12.816979
KEYWORDS: Photonic crystals, Polymers, Silicon, Lithography, Refraction, Holography, Silica, Distortion, Photoresist materials, Crystals

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