Dr. Xuelong Shi
Engineer at ASML US Inc
SPIE Involvement:
Author
Publications (46)

Proceedings Article | 4 April 2007
Proc. SPIE. 6518, Metrology, Inspection, and Process Control for Microlithography XXI
KEYWORDS: Mathematical modeling, Lithography, Data modeling, Imaging systems, Calibration, Image processing, Design for manufacturing, Photomasks, Optical proximity correction, Statistical modeling

Proceedings Article | 20 May 2006
Proc. SPIE. 6283, Photomask and Next-Generation Lithography Mask Technology XIII
KEYWORDS: Optical lithography, Imaging systems, Etching, Quartz, Printing, Photomasks, Optical proximity correction, Mask making, Semiconducting wafers, Resolution enhancement technologies

Proceedings Article | 9 November 2005
Proc. SPIE. 5992, 25th Annual BACUS Symposium on Photomask Technology
KEYWORDS: Lithography, Optical lithography, Lithographic illumination, 3D modeling, Printing, Photomasks, Optical proximity correction, Semiconducting wafers, Model-based design, Resolution enhancement technologies

Proceedings Article | 28 June 2005
Proc. SPIE. 5853, Photomask and Next-Generation Lithography Mask Technology XII
KEYWORDS: Optical imaging, Lithography, Reticles, Image processing, 3D modeling, Feature extraction, Image analysis, Printing, Photomasks, Phase shifts

Proceedings Article | 28 June 2005
Proc. SPIE. 5853, Photomask and Next-Generation Lithography Mask Technology XII
KEYWORDS: Lithography, Diffraction, Spatial frequencies, Manufacturing, Fourier transforms, Constructive interference, Linear filtering, Photomasks, Source mask optimization, System on a chip

Proceedings Article | 28 June 2005
Proc. SPIE. 5853, Photomask and Next-Generation Lithography Mask Technology XII
KEYWORDS: Lithography, Diffractive optical elements, Scattering, Manufacturing, Printing, Photomasks, Optical proximity correction, Semiconducting wafers, Performance modeling, Model-based design

Showing 5 of 46 publications
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