Dr. Xumou Xu
Member of Technical Staff at Applied Materials Inc
SPIE Involvement:
Author
Publications (11)

PROCEEDINGS ARTICLE | March 23, 2012
Proc. SPIE. 8322, Extreme Ultraviolet (EUV) Lithography III
KEYWORDS: Lithography, Calibration, Metals, Ultraviolet radiation, Finite element methods, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers, Back end of line

PROCEEDINGS ARTICLE | March 23, 2011
Proc. SPIE. 7973, Optical Microlithography XXIV
KEYWORDS: Amorphous silicon, Oxides, Lithography, Electron beam lithography, Optical lithography, Spatial frequencies, Etching, Image processing, Silicon, Immersion lithography

PROCEEDINGS ARTICLE | March 23, 2011
Proc. SPIE. 7973, Optical Microlithography XXIV
KEYWORDS: Oxides, Lithography, Optical lithography, Etching, Image processing, Photomasks, Double patterning technology, 193nm lithography, Back end of line, Front end of line

PROCEEDINGS ARTICLE | March 23, 2011
Proc. SPIE. 7973, Optical Microlithography XXIV
KEYWORDS: Oxides, Lithography, Electron beam lithography, Optical lithography, Etching, Silicon, Photomasks, Line width roughness, Immersion lithography, Line edge roughness

PROCEEDINGS ARTICLE | April 1, 2009
Proc. SPIE. 7273, Advances in Resist Materials and Processing Technology XXVI
KEYWORDS: Lithography, Optical lithography, Etching, Manufacturing, Scanning electron microscopy, Photomasks, Chemical reactions, Line edge roughness, Photoresist processing, Semiconducting wafers

PROCEEDINGS ARTICLE | March 16, 2009
Proc. SPIE. 7274, Optical Microlithography XXII
KEYWORDS: Oxides, Lithography, Optical lithography, Etching, Resistance, Scanning electron microscopy, Photoresist materials, Photomasks, Double patterning technology, Line edge roughness

Showing 5 of 11 publications
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