Dr. Xun Xiang
at GLOBALFOUNDRIES. Inc
SPIE Involvement:
Author
Publications (1)

PROCEEDINGS ARTICLE | April 9, 2018
Proc. SPIE. 10589, Advanced Etch Technology for Nanopatterning VII
KEYWORDS: Optical lithography, Etching, Extreme ultraviolet, Line width roughness, Plasma etching, Extreme ultraviolet lithography, Deposition processes, Line edge roughness, Photoresist processing, Plasma

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