Dr. Ya-Ching Hou
at IM Flash Technologies LLC
SPIE Involvement:
Publications (4)

Proceedings Article | 18 March 2015 Paper
Proceedings Volume 9426, 942607 (2015) https://doi.org/10.1117/12.2085826
KEYWORDS: Critical dimension metrology, Semiconducting wafers, Scanners, Lithography, Control systems, Yield improvement, Optical proximity correction, Overlay metrology, Process control, Metals

SPIE Journal Paper | 1 July 2007
Jonathan Ho, Yan Wang, Joanne Wu, Ya-Ching Hou, Ke-Chih Wu
JM3, Vol. 6, Issue 03, 031008, (July 2007) https://doi.org/10.1117/12.10.1117/1.2781584
KEYWORDS: Optical proximity correction, Design for manufacturability, Lithography, Design for manufacturing, Metals, Scanning electron microscopy, Semiconducting wafers, Holmium, Calibration, Integrated circuit design

Proceedings Article | 27 March 2007 Paper
Proceedings Volume 6520, 65204J (2007) https://doi.org/10.1117/12.711367
KEYWORDS: Polarization, Metals, Resolution enhancement technologies, Printing, Semiconducting wafers, Logic, Image processing, Optical lithography, Line width roughness, Image resolution

Proceedings Article | 14 March 2006 Paper
Proceedings Volume 6156, 61560C (2006) https://doi.org/10.1117/12.656085
KEYWORDS: Design for manufacturing, Optics manufacturing, Optical simulations, Optical proximity correction, Critical dimension metrology, Field programmable gate arrays, Metals, Scanning electron microscopy, Diffraction, Microelectronics

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