Dr. Ya-Ching Hou
at IM Flash Technologies LLC
SPIE Involvement:
Author
Publications (4)

Proceedings Article | 18 March 2015
Proc. SPIE. 9426, Optical Microlithography XXVIII
KEYWORDS: Critical dimension metrology, Semiconducting wafers, Scanners, Lithography, Control systems, Yield improvement, Optical proximity correction, Overlay metrology, Process control, Metals

SPIE Journal Paper | 1 July 2007
JM3 Vol. 6 Issue 03
KEYWORDS: Optical proximity correction, Design for manufacturability, Lithography, Design for manufacturing, Metals, Scanning electron microscopy, Semiconducting wafers, Holmium, Calibration, Integrated circuit design

Proceedings Article | 27 March 2007
Proc. SPIE. 6520, Optical Microlithography XX
KEYWORDS: Polarization, Metals, Resolution enhancement technologies, Printing, Semiconducting wafers, Logic, Image processing, Optical lithography, Line width roughness, Image resolution

Proceedings Article | 14 March 2006
Proc. SPIE. 6156, Design and Process Integration for Microelectronic Manufacturing IV
KEYWORDS: Design for manufacturing, Optics manufacturing, Optical simulations, Optical proximity correction, Critical dimension metrology, Field programmable gate arrays, Metals, Scanning electron microscopy, Diffraction, Microelectronics

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