Dr. Yuyang Sun
SPIE Involvement:
Conference Program Committee | Author
Publications (1)

PROCEEDINGS ARTICLE | March 30, 2017
Proc. SPIE. 10148, Design-Process-Technology Co-optimization for Manufacturability XI
KEYWORDS: Logic, Optical lithography, Visualization, Etching, Metals, Error analysis, Manufacturing, Monte Carlo methods, Solids, Photomasks, Directed self assembly, Optical proximity correction, Resolution enhancement technologies

Conference Committee Involvement (3)
Photomask Technology
17 September 2018 | Monterey, California, United States
Advanced Etch Technology for Nanopatterning VII
26 February 2018 | San Jose, California, United States
Photomask Technology
11 September 2017 | Monterey, California, United States
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