Dr. Yair Eran
Director at Applied Materials Ltd
SPIE Involvement:
Author
Publications (27)

Proceedings Article | 8 October 2014
Proc. SPIE. 9235, Photomask Technology 2014
KEYWORDS: Optical lithography, Inspection, Image resolution, Photomasks, Artificial intelligence, Source mask optimization, Optical proximity correction, SRAF, Evolutionary algorithms, Resolution enhancement technologies

Proceedings Article | 5 September 2001
Proc. SPIE. 4409, Photomask and Next-Generation Lithography Mask Technology VIII
KEYWORDS: Reticles, Cadmium, Databases, Composites, Inspection, Inspection equipment, Photomasks, Critical dimension metrology, Tolerancing, System on a chip

Proceedings Article | 9 April 2001
Proc. SPIE. 4349, 17th European Conference on Mask Technology for Integrated Circuits and Microcomponents
KEYWORDS: Lithographic illumination, Databases, Inspection, Wafer inspection, Photomasks, Computed tomography, Optical proximity correction, Data conversion, Semiconducting wafers, Defect inspection

Proceedings Article | 22 January 2001
Proc. SPIE. 4186, 20th Annual BACUS Symposium on Photomask Technology
KEYWORDS: Lithography, Scattering, Opacity, Inspection, Photomasks, Optical proximity correction, Critical dimension metrology, Semiconducting wafers, Resolution enhancement technologies, Phase shifts

Proceedings Article | 22 January 2001
Proc. SPIE. 4186, 20th Annual BACUS Symposium on Photomask Technology
KEYWORDS: Photomask technology

Showing 5 of 27 publications
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