Masatoshi Yamato
at Tokyo Electron Ltd
SPIE Involvement:
Author
Publications (19)

PROCEEDINGS ARTICLE | March 13, 2018
Proc. SPIE. 10586, Advances in Patterning Materials and Processes XXXV
KEYWORDS: Oxides, Carbon, Optical lithography, Etching, Polymers, Silicon, Scanning electron microscopy, Silicon carbide, Reactive ion etching, System on a chip

PROCEEDINGS ARTICLE | April 5, 2017
Proc. SPIE. 10146, Advances in Patterning Materials and Processes XXXIV
KEYWORDS: Carbon, Lithography, Optical lithography, Silica, Etching, Silicon films, Atomic layer deposition, Line width roughness, Double patterning technology, Line edge roughness

PROCEEDINGS ARTICLE | March 27, 2017
Proc. SPIE. 10143, Extreme Ultraviolet (EUV) Lithography VIII
KEYWORDS: Lithography, Logic, Optical lithography, Etching, Image processing, Extreme ultraviolet, Extreme ultraviolet lithography, Critical dimension metrology, Line edge roughness, Imaging arrays, Stochastic processes, Overlay metrology, Edge roughness

PROCEEDINGS ARTICLE | March 27, 2017
Proc. SPIE. 10146, Advances in Patterning Materials and Processes XXXIV
KEYWORDS: Lithography, Logic, Optical lithography, Etching, Inspection, Process control, Extreme ultraviolet, Extreme ultraviolet lithography, Immersion lithography, Critical dimension metrology, 193nm lithography

PROCEEDINGS ARTICLE | March 25, 2016
Proc. SPIE. 9779, Advances in Patterning Materials and Processes XXXIII
KEYWORDS: Lithography, Logic, Optical lithography, Etching, Photoresist materials, Process control, Atomic layer deposition, Critical dimension metrology, Line edge roughness, Photoresist processing, System on a chip

PROCEEDINGS ARTICLE | March 25, 2016
Proc. SPIE. 9779, Advances in Patterning Materials and Processes XXXIII
KEYWORDS: Lithography, Logic, Optical lithography, Etching, Polymers, Error analysis, Materials processing, Process control, Photomasks, Field effect transistors, Reactive ion etching, Photoresist processing, Overlay metrology

Showing 5 of 19 publications
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