Yan A. Borodovsky
Intel Senior Fellow (Retired) at
SPIE Involvement:
Fellow status | Author
Publications (14)

PROCEEDINGS ARTICLE | April 3, 2010
Proc. SPIE. 7641, Design for Manufacturability through Design-Process Integration IV
KEYWORDS: Photomasks, Optical lithography, Glasses, Design for manufacturing, Phase shifts, SRAF, Semiconducting wafers, Cadmium, Metals, Lithography

PROCEEDINGS ARTICLE | March 31, 2010
Proc. SPIE. 7639, Advances in Resist Materials and Processing Technology XXVII
KEYWORDS: Optical lithography, Floods, Lithography, Image processing, Systems modeling, Photoresist processing, MATLAB, Optical engineering, Diffraction, Semiconducting wafers

PROCEEDINGS ARTICLE | April 1, 2009
Proc. SPIE. 7273, Advances in Resist Materials and Processing Technology XXVI
KEYWORDS: Optical lithography, Molecules, 193nm lithography, Lithography, Absorption, Near ultraviolet, Semiconducting wafers, Absorbance, Xenon, Manufacturing

PROCEEDINGS ARTICLE | March 7, 2008
Proc. SPIE. 6924, Optical Microlithography XXI
KEYWORDS: Photomasks, Glasses, Optical lithography, Mask making, Near field, Semiconducting wafers, Resolution enhancement technologies, Imaging systems, Projection systems, Image transmission

PROCEEDINGS ARTICLE | March 7, 2008
Proc. SPIE. 6924, Optical Microlithography XXI
KEYWORDS: Photomasks, Optical lithography, Glasses, Semiconducting wafers, SRAF, Cadmium, Phase shifts, Modulation, Image transmission, Etching

PROCEEDINGS ARTICLE | March 7, 2008
Proc. SPIE. 6924, Optical Microlithography XXI
KEYWORDS: Photomasks, Optical proximity correction, Manufacturing, Image quality, Glasses, Lithography, Optical lithography, Computational lithography, Optimization (mathematics), Semiconducting wafers

Showing 5 of 14 publications
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