Dr. Yan Guo
at Nearfield Instruments BV
SPIE Involvement:
Author
Publications (5)

Proceedings Article | 10 April 2024 Poster + Paper
Y. Guo, H. Pahlavani, A. Khachaturiants, K. Elsayed, J. van de Laar, E. Simons, N. Saikumar, H. Sadeghian
Proceedings Volume 12955, 129553I (2024) https://doi.org/10.1117/12.3011237
KEYWORDS: Scanning probe microscopy, Image processing, Education and training, Image segmentation, Algorithm development, Defect detection, Metrology, Feature extraction, Machine learning, Defect inspection

Proceedings Article | 10 April 2024 Poster + Paper
L. Rencker, O. Tajalizadehkhoob, K. Elsayed, A. Khachaturiants, H. Pahlavani, Y. Guo, J. van de Laar, E. Simons, N. Saikumar, H. Sadeghian
Proceedings Volume 12955, 129553J (2024) https://doi.org/10.1117/12.3011239
KEYWORDS: Image enhancement, Image resolution, Resolution enhancement technologies, Scanning probe microscopy, Machine learning, Semiconductors, Metrology, Image restoration

Proceedings Article | 16 September 2022 Paper
M. Mucientes, A. Khachaturiants, R. Trussell, A. Kalinin, Y. Guo, E. Simons, S. Kim, O. Nadyarnykh, A. Moussa, J. Bogdanowicz, J. Severi, G. Lorusso, D. De Simone, A.-L. Charley, P. Leray, M. van Reijzen, C. Bozdog, H. Sadeghian
Proceedings Volume 12325, 123250M (2022) https://doi.org/10.1117/12.2641698
KEYWORDS: Scanning probe microscopy, Semiconducting wafers, Metrology, Optical lithography, Bridges, Extreme ultraviolet lithography, Defect inspection, Photoresist materials, Inspection, Atomic force microscopy

Proceedings Article | 13 June 2022 Presentation
Artem Khatchaturiants, Marta Mucientes, Arseniy Kalinin, Yan Guo, Seokhan Kim, Alain Moussa, Janusz Bogdanowicz, Joren Severi, Gian Lorusso, Danilo De Simone, Anne-Laure Charley, Philippe Leray, Maarten van Reijzen, Cornel Bozdog, Hamed Sadeghian
Proceedings Volume PC12053, PC120530I (2022) https://doi.org/10.1117/12.2616089
KEYWORDS: Scanning probe microscopy, Metrology, Photoresist materials, Extreme ultraviolet lithography, Scanning probe metrology, Profiling, Process control, Extreme ultraviolet, Atomic force microscopy, Stochastic processes

Proceedings Article | 26 May 2022 Presentation + Paper
I. Battisti, K. Makles, M. S. Mucientes, Y. Guo, E. Simons, J. Bogdanowicz, A. Moussa, V. Blanco, F. Yasin, D. Crotti, A.-L. Charley, P. Leray, M. van Reijzen, C. Bozdog, H. Sadeghian
Proceedings Volume 12053, 1205310 (2022) https://doi.org/10.1117/12.2616093
KEYWORDS: Overlay metrology, Semiconducting wafers, Opacity, Atomic force microscopy, Scanning probe metrology, Image resolution, Pixel resolution, Photomasks

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