Yan Wang
at Photon Dynamics Inc An Orbotech Co
SPIE Involvement:
Author
Publications (9)

Proceedings Article | 13 March 2009 Paper
Proc. SPIE. 7275, Design for Manufacturability through Design-Process Integration III
KEYWORDS: Lithography, Diffusion, Field programmable gate arrays, Lens design, Design for manufacturing, Transistors, Immersion lithography, Critical dimension metrology, Design for manufacturability

Proceedings Article | 4 March 2008 Paper
Proc. SPIE. 6925, Design for Manufacturability through Design-Process Integration II
KEYWORDS: Lithography, Oscillators, Etching, Diffusion, Scanning electron microscopy, Transistors, Optical proximity correction, Semiconducting wafers, Model-based design, Standards development

SPIE Journal Paper | 1 October 2007
JM3 Vol. 6 Issue 04
KEYWORDS: Head, Liquids, Inkjet technology, Microfluidics, Silicon, Printing, Video, Imaging systems, Satellites, Resistance

SPIE Journal Paper | 1 July 2007
JM3 Vol. 6 Issue 03
KEYWORDS: Optical proximity correction, Design for manufacturability, Lithography, Design for manufacturing, Metals, Scanning electron microscopy, Semiconducting wafers, Holmium, Calibration, Integrated circuit design

Proceedings Article | 21 March 2007 Paper
Proc. SPIE. 6521, Design for Manufacturability through Design-Process Integration
KEYWORDS: Lithography, Cadmium, Data modeling, Calibration, Scanning electron microscopy, Optical proximity correction, Critical dimension metrology, Semiconducting wafers, Optical calibration, Process modeling

Showing 5 of 9 publications
SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Advertisement
Advertisement
Back to Top