Yang-Chun Cheng
at Univ of Wisconsin-Madison
SPIE Involvement:
Author
Publications (5)

Proceedings Article | 29 September 2009 Paper
Proc. SPIE. 7451, Soft X-Ray Lasers and Applications VIII
KEYWORDS: Lithography, Nanostructures, Coherence imaging, Holography, Capillaries, Interferometry, Printing, Photoresist materials, Photomasks, X-ray lithography

SPIE Journal Paper | 1 April 2009
JM3 Vol. 8 Issue 02
KEYWORDS: Modulation, Diffraction gratings, Photomasks, Diffraction, Lithography, Extreme ultraviolet lithography, Extreme ultraviolet, Interferometry, Fringe analysis, Interferometers

Proceedings Article | 18 March 2009 Paper
Proc. SPIE. 7271, Alternative Lithographic Technologies
KEYWORDS: Lithography, Holography, 3D image reconstruction, Image resolution, Photoresist materials, Computer generated holography, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Nanolithography

Proceedings Article | 16 March 2009 Paper
Proc. SPIE. 7274, Optical Microlithography XXII
KEYWORDS: Lithography, Microfluidics, Optical lithography, Glasses, Ultraviolet radiation, Linear filtering, Photomasks, Maskless lithography, Digital micromirror devices, Semiconducting wafers

Proceedings Article | 21 March 2008 Paper
Proc. SPIE. 6921, Emerging Lithographic Technologies XII
KEYWORDS: Lithography, Polymethylmethacrylate, Modulation, Interferometry, Chromium, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers, Diffraction gratings

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