Yaniv Abramovitz
at Applied Materials Israel Ltd
SPIE Involvement:
Author
Publications (5)

Proceedings Article | 22 February 2021 Presentation
Proc. SPIE. 11611, Metrology, Inspection, and Process Control for Semiconductor Manufacturing XXXV

Proceedings Article | 22 February 2021 Presentation
Proc. SPIE. 11611, Metrology, Inspection, and Process Control for Semiconductor Manufacturing XXXV
KEYWORDS: Image enhancement, Overlay metrology, Metrology, Hassium, Scanning electron microscopy, Process control, Optical lithography, Measurement devices, Inspection, Electron beam lithography

Proceedings Article | 25 June 2020 Presentation + Paper
Proc. SPIE. 11325, Metrology, Inspection, and Process Control for Microlithography XXXIV
KEYWORDS: Overlay metrology, Scanning electron microscopy, Scanning transmission electron microscopy, Wafer-level optics, Semiconducting wafers, Line edge roughness, Photomasks, Transmission electron microscopy, Dysprosium, Metrology

Proceedings Article | 24 March 2020 Presentation + Paper
Proc. SPIE. 11325, Metrology, Inspection, and Process Control for Microlithography XXXIV
KEYWORDS: Overlay metrology, Semiconducting wafers, Scanning electron microscopy, Photomasks, Metrology, Wafer-level optics, Etching, Transmission electron microscopy

Proceedings Article | 8 March 2016 Paper
Proc. SPIE. 9778, Metrology, Inspection, and Process Control for Microlithography XXX
KEYWORDS: Personal protective equipment, Metrology, Lithography, Overlay metrology, Photomasks, Scanners, Lithographic illumination, SRAF, Neodymium, Optical proximity correction

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