Dr. Yannick Bourgin Profile

Dr. Yannick Bourgin

at Technische Univ Ilmenau

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Author

Publications (8)

Proceedings Article | 14 September 2018 Presentation + Paper

High power laser beam shaping for welding applications by means of diffractive elements

Yannick Bourgin, Falk Nagel, Patrick Feßer, Jean-Pierre Bergmann, Stefan Sinzinger

Proceedings Volume 10744, 107440X (2018) https://doi.org/10.1117/12.2320579

KEYWORDS: Diffractive optical elements, Computer generated holography, High power lasers, Metals, Gas lasers, Lithography, Laser welding, Diffusers, Semiconductor lasers, Etching

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Proceedings Article | 20 October 2016 Paper

Advanced photomask fabrication by e-beam lithography for mask aligner applications

T. Weichelt, Y. Bourgin, M. Banasch, U. Zeitner

Proceedings Volume 10032, 1003204 (2016) https://doi.org/10.1117/12.2248545

KEYWORDS: Photomasks, Electron beam lithography, Polarizers, Lithography, Diffraction, Vestigial sideband modulation, Photoresist materials, Beam shaping, Semiconducting wafers, Scanning electron microscopy

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Proceedings Article | 21 April 2016 Paper

Large area gold coated nano-needles fabricated by proximity mask aligner lithography for plasmonic AR-structures

Yannick Bourgin, Dirk Michaelis, Thomas Käsebier, Peter Dannberg, Uwe Zeitner

Proceedings Volume 9884, 98842I (2016) https://doi.org/10.1117/12.2227129

KEYWORDS: Photomasks, Plasmonics, Lithography, Nanolithography, Semiconducting wafers, Reflection, Gold, Nanostructures, Chromium, Apertures, Polymers, Absorption, Polarization, Lithographic illumination, Glasses

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Proceedings Article | 15 March 2016 Paper

Alternative high-resolution lithographic technologies for optical applications

Uwe Zeitner, Tina Weichelt, Yannick Bourgin, Robert Kinder

Proceedings Volume 9780, 97800R (2016) https://doi.org/10.1117/12.2222028

KEYWORDS: Lithography, Photomasks, Diffraction, Fabrication, Vestigial sideband modulation, 3D scanning, Computing systems, Micro optics, Optical resolution, Beam shaping, Electron beam lithography, Binary data, Printing, Optical components

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Proceedings Article | 15 March 2016 Paper

Periodic sub-100nm structures fabricated by proximity i-line mask-aligner lithography (and self-aligned double patterning)

Yannick Bourgin, Daniel Voigt, Thomas Käsebier, Ernst-Bernhard Kley, Uwe Zeitner

Proceedings Volume 9780, 978014 (2016) https://doi.org/10.1117/12.2218610

KEYWORDS: Lithography, Metals, Photomasks, Polymers, Electron beam lithography, Double patterning technology, Diffraction gratings, Aluminum, Optical components, Optical lithography, Photoresist materials, Nanolithography, Coating, Scanning electron microscopy

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Proceedings Article | 18 March 2015 Paper

Double-sided diffractive photo-mask for sub-500nm resolution proximity i-line mask-aligner lithography

Yannick Bourgin, Thomas Siefke, Thomas Käsebier, Ernst-Bernhard Kley, Uwe Zeitner

Proceedings Volume 9426, 94260E (2015) https://doi.org/10.1117/12.2085777

KEYWORDS: Photomasks, Polarizers, Lithography, Etching, Lithographic illumination, Chromium, Photomicroscopy, Silica, Ion beams, Reactive ion etching

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SPIE Journal Paper | 1 March 2011

On-the-fly writing of a long grating phase mask

Philipp Muller, Yves Jourlin, Colette Veillas, Gerard Bernaud, Yannick Bourgin, Svetlen Tonchev, Olivier Dellea

OE, Vol. 50, Issue 03, 038001, (March 2011) https://doi.org/10.1117/12.10.1117/1.3549254

KEYWORDS: Photomasks, Diffraction gratings, Diffraction, Electron beam lithography, Optical engineering, Interferometers, Lithography, Photoresist materials, Silica, Tolerancing

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Proceedings Article | 13 May 2010 Paper

Monolithic dual-grating phase mask for long grating writing

Yannick Bourgin, Sanaa Bakkali, Yves Jourlin, Svetlen Tonchev, Olivier Parriaux

Proceedings Volume 7716, 77161M (2010) https://doi.org/10.1117/12.854133

KEYWORDS: Photomasks, Diffraction gratings, Photoresist materials, Printing, Beam splitters, Aluminum, Scanning electron microscopy, Spatial frequencies, Diffraction, Sensors

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Showing 5 of 8 publications

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