Dr. Yannick Vesters
PhD Researcher at imec
SPIE Involvement:
Publications (12)

Proceedings Article | 16 October 2019 Presentation
Greg O'Callaghan, Carmen Popescu, Yannick Vesters, Alexandra McClelland, John Roth, Wolfgang Theis, Alex P. Robinson
Proceedings Volume 11147, 111470K (2019) https://doi.org/10.1117/12.2538374
KEYWORDS: Extreme ultraviolet lithography, Opacity, Photoresist materials, Line width roughness, Photoresist developing, Stochastic processes, Scanners, Electron beam lithography, High volume manufacturing, Chemically amplified resists

Proceedings Article | 26 September 2019 Presentation + Paper
Proceedings Volume 11147, 111470J (2019) https://doi.org/10.1117/12.2536348
KEYWORDS: Extreme ultraviolet lithography, Polymers, Lithography, Photoresist materials, Photoresist developing, Extreme ultraviolet, Electron beam lithography, Line width roughness, Semiconducting wafers, Line edge roughness

SPIE Journal Paper | 12 December 2018
JM3, Vol. 17, Issue 04, 043506, (December 2018) https://doi.org/10.1117/12.10.1117/1.JMM.17.4.043506
KEYWORDS: Absorption, Photoresist materials, Photons, Extreme ultraviolet, Electrons, Optical lithography, Chemically amplified resists, Extreme ultraviolet lithography, Photoresist developing, Metals

Proceedings Article | 12 October 2018 Presentation
Proceedings Volume 10809, 108090K (2018) https://doi.org/10.1117/12.2501811
KEYWORDS: Line edge roughness, Extreme ultraviolet lithography, Molecules, Chemically amplified resists, Lithography, Optical lithography, High volume manufacturing, Photoresist materials, Diffusion, Stochastic processes

Proceedings Article | 3 October 2018 Presentation + Paper
Proceedings Volume 10809, 108090U (2018) https://doi.org/10.1117/12.2502915
KEYWORDS: Extreme ultraviolet lithography, Line edge roughness, Line width roughness, Logic, Nanoimprint lithography, Optical lithography, Metals, System on a chip, Fourier transforms, Extreme ultraviolet

Showing 5 of 12 publications
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