Dr. Yao-Ching Ku
Dirctor at Taiwan Semiconductor Manufacturing Co Ltd
SPIE Involvement:
Conference Program Committee | Author
Publications (29)

PROCEEDINGS ARTICLE | April 2, 2014
Proc. SPIE. 9050, Metrology, Inspection, and Process Control for Microlithography XXVIII
KEYWORDS: Diffraction, Metrology, Etching, Scanners, Process control, Semiconducting wafers, Overlay metrology, Back end of line, Front end of line

PROCEEDINGS ARTICLE | March 27, 2014
Proc. SPIE. 9051, Advances in Patterning Materials and Processes XXXI
KEYWORDS: Lithography, Polymers, Silicon, Quantitative analysis, Organic materials, Finite element methods, Photomasks, Photoresist processing, Semiconducting wafers, Defect inspection

PROCEEDINGS ARTICLE | April 10, 2013
Proc. SPIE. 8681, Metrology, Inspection, and Process Control for Microlithography XXVII
KEYWORDS: Diffraction, Metrology, Scanners, Time metrology, High volume manufacturing, Thin film coatings, Semiconducting wafers, Overlay metrology, Tin, Chemical mechanical planarization

PROCEEDINGS ARTICLE | March 29, 2013
Proc. SPIE. 8682, Advances in Resist Materials and Processing Technology XXX
KEYWORDS: Lithography, FT-IR spectroscopy, Polymers, Silicon, Diffusion, Coating, Semiconductor manufacturing, Chemical analysis, Photoresist processing, Prototyping

PROCEEDINGS ARTICLE | March 19, 2012
Proc. SPIE. 8325, Advances in Resist Materials and Processing Technology XXIX
KEYWORDS: Scattering, Polymers, Diffusion, Inspection, Printing, Line width roughness, Semiconductor manufacturing, Immersion lithography, Optics manufacturing, Resolution enhancement technologies

PROCEEDINGS ARTICLE | April 16, 2011
Proc. SPIE. 7972, Advances in Resist Materials and Processing Technology XXVIII
KEYWORDS: Electron beam lithography, Polymers, Metals, Electrons, Resistance, Scanning electron microscopy, Monte Carlo methods, Photomasks, Critical dimension metrology, Polymer thin films

Showing 5 of 29 publications
Conference Committee Involvement (3)
Optical Microlithography XXI
26 February 2008 | San Jose, California, United States
Optical Microlithography XX
27 February 2007 | San Jose, California, United States
Optical Microlithography XIX
21 February 2006 | San Jose, California, United States
SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Advertisement
Advertisement
Back to Top