Yaobin Feng
Photo Process Section Manager at XMC
SPIE Involvement:
Author
Publications (2)

PROCEEDINGS ARTICLE | March 28, 2017
Proc. SPIE. 10145, Metrology, Inspection, and Process Control for Microlithography XXXI
KEYWORDS: Oxides, Lithography, Diffraction, Optical design, Scanners, Interfaces, Manufacturing, Process control, Optical alignment, Structural design, Semiconducting wafers, Overlay metrology, Diffraction gratings, Absorption

SPIE Journal Paper | November 23, 2015
JM3 Vol. 14 Issue 04
KEYWORDS: Electroluminescence, Source mask optimization, Photomasks, Optical proximity correction, Computational lithography, Diffractive optical elements, Metals, Lithography, Manufacturing, Optimization (mathematics)

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